NIFS-625

FULL TEXT (PDF, 443 KB)

Author(s):

K. Nishimura

Title:

Wakefield of a Charged Particulate Influenced by Emission Process of Secondary Electrons

Date of publication:

Mar. 2000

Key words:

dusty plasma, plasma crystal, wakefield, particle simulation

Abstract:

Wakefield of a charged particulate in a streaming plasma is investigated by a three-dimensional particle simulation. A difference is found in wakefields between a negatively charged particulate and a positively charged one, depending on the velocity of the particulate relative to that of the streaming plasma.

List of NIFS Report (1999)Return toContents Page Return toNIFS Homepage
footer
 National Institute for Fusion Science
Copyright: 1995-2007 National Institute for Fusion Science (NIFS)
Address: 322-6,Oroshi-cho, Toki, GIFU, 509-5292, Japan
Telephone:+81-572-58-2222