Design and fabrication of a DC cylindrical magnetron sputtering device in semi-industrial size and the first experimental results of the device operation are reported. System consists of two coaxial cylinder (R=20, 46 cm) at 2 to 5 kV potential difference. The internal cylinder, cathode, can be cooled by water continuously. The volume of the plasma between the cylinders is 370 lit. The mirror-like coil located around the cylinder outside the vacuum generates an axial magnetic field up to 600 G. Another small coil at the center of the chamber is employed to uniform the magnetic field lines in the region near the ends of cylinder. The effect of poloidal drift due to axial uniform magnetic field on ionization rate is observed. In the testing step, thin films of copper and brass are sputtered on the glass substrate. Different characteristics of structures of the sputtered layers as the function of machine variables are studied experimentally. The effect of variation of pressure, magnetic field and working voltage are studied. Big dimension of cathode and anode leads to uniform sputtered layer on the substrate. This work should be contributed to the development of sputtering devices in industrial size. Detail will be presented in the full paper.