NIFS-975

FULL TEXT (PDF, 52KB)


Author(s):

Y. Oya, N. Ashikawa, K. Nishimura, A. Sagara and K. Okuno

Title:

Impurity effects on hydrogen isotope retention in boronized wall of LHD

Date of publication:

Nov. 2010

Key words:

22 IAEA Fusion Energy Conference, EXD/P3-25

Abstract:

The impurity effect on hydrogen isotopes retention in the boron film deposited in LHD was evaluated by means of XPS and TDS. It was found that the impurity concentrations in boron film were increased after H-H main plasma exposure in LHD. The ratio of hydrogen retention trapped by impurity to total hydrogen retention during H-H main plasma exposure was reached to 70%, although that of deuterium retention by impurity in D2 + implanted LHD-boron film was about 35%. In addition, the dynamic chemical sputtering of hydrogen isotopes with impurity as the form of water and / or hydrocarbons was occurred by energetic hydrogen isotopes irradiation. It was expected that the enhancement of impurity concentration during plasma exposure in LHD would induce the dynamic formation of volatile molecules and their re-emission to plasma. These facts would prevent stable plasma operation in LHD, concluding that the dynamic impurity behavior in boron film during plasma exposure is one of key issues for the steady-state plasma operation in LHD.

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